Further insights into the growth mechanism of the non-stoichiometric θ-Ni2Si phase

The solid state reaction of 50 nm Ni with Si(100) substrate was investigated using in situ X-ray diffraction (XRD). sequence is simultaneous; it begins by δ-Ni2Si phase then the metastable θ-Ni2Si formed. Both phases grow simultaneously. growth mechanism non-stoichiometric discussed on basis evolution its XRD peak during annealing. results show that, growth, split into two regions different concentrations. This “original” behavior justified discontinuous variation composition both diffusion coefficient and d-lattice spacing through phase.